Research and Development, Process Development, Low Level Production
Plasma Dynamics is devoted to the plasma processing of advanced materials by reactive
ion etching (RIE) and plasma enhanced chemical vapor deposition (PECVD). Our clients include
companies in the biotech, photonics, failure analysis,
and electronics fields, as well as colleges and universities.
Our equipment is located in a 1,200 sq/ft Class 10,000 clean room.
- Trion Minilock II with loadlock and ICP and a Technics RIE
- Trion Orion II PECVD with loadlock and ICP
- Anatech 600 and Drytek MS-6 plasma etchers
- Amray field emission microscopes