About Us
Plasma Dynamics is a privately held company devoted exclusively to the plasma processing
of advanced materials by reactive ion etching (RIE) and plasma enhanced chemical
vapor deposition (PECVD). Company services include R&D, process development, and
low level production.
History
In 2003, Dr. Vilnis Kreismanis founded Massachusetts-based Plasma Dynamics, LLC.
Dr. Kreismanis has over 30 years of experience in semiconductor processing; II-VI
and III-V compound semiconductor growth; and quantum electronics.
Recent Publications
Sonek, G. J., and V. G. Kreismanis. "A Silicon-Based Subwavelength Structure Suitable for Sensitive Molecular
Detection." Proc. SPIE 6370 (2006): 63701H.
Sonek, G. J., and V. G. Kreismanis. "Reactive Ion Etching of Motheye and Photonic Crystal Silicon Nanostructures
Using CBrF3." Proc. SPIE 6002 (2005):
600219.
Directions
Plasma Dynamics is conveniently located in Wilmington, MA. View a map at: Google Maps | Yahoo! Maps | Mapquest
From I-93 South
Take exit 41 (Rt. 125). Turn left at the end of the ramp, cross over I-93, and go
through first traffic light. At the seond traffic light, turn left onto Andover
Street. Plasma Dynamics is located after approximately 0.2 miles on the right side.
From I-93 North
Take exit 41 (Rt. 125). Bear right at the end of the ramp, and go through the first
traffic light. At the second traffic light, turn left onto Andover Street. Plasma
Dynamics is located after approximately 0.2 miles on the right side.